Job description
Work Activities
This experiment-oriented postdoctoral position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department and its EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.
In our group’s research we, for example, uncovered the quantum origins of the generated EUV light [Torretti, Nature Comms. Nature Commun. 11, (2020)], found a universal law for expanding plasma [Sheil, Phys. Rev. Lett. 133, (2024)], and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources [Liu, Phys. Rev. Appl. 20, (2023)], and work on an alternative EUV source solution [Mostafa, Appl. Phys. Lett. 123, (2023)] – a concept that is most relevant for the current vacancy.
Background
The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient features on chips. The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by powerful laser pulses. At ARCNL, we are now thinking about the next generation of light sources: Can we make more energy efficient and more powerful EUV light sources?
Project goal
To identify what light source will power the next generation of lithography machines, we need to understand what plasma conditions are optimal for producing light from plasma, but also we need to understand how such plasma should be generated, and what laser technology should be used. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, and work with advanced laser technologies, to understand the emission of light and ions from plasma that you generate.
Qualifications
You have (or will soon obtain) a PhD in (Applied) Physics
Knowledge of experimental laser and/or plasma physics is an asset, especially if combined with strong hands-on laboratory skills
Programming experience, particularly in Python, is welcomed
Strong verbal and written communication skills in English are required
Work environment
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and associate partner the University of Groningen (UG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also www.arcnl.nl
Working conditions
The position is a full-time appointment (40 hours per week, 12 months per year) with the Netherlands Foundation for Scientific Research Institutes (NWO-I) for a period of up to three years. The salary is based on scale 10 (CAO-OI) and comes with comprehensive range of employment benefits. Non-Dutch applicants may be eligible for the advantageous 30% tax ruling. ARCNL supports incoming international researchers with housing and visa arrangements and provides reimbursement for travel and furnishing expenses.
We also offer:
- Responsibility over a setup including bespoke droplet generators and unique & state-of-the-art high-energy laser systems
- The ability to improve your experimental and leadership skills in extensive experimental campaigns
- Collaboration with the in-house theory group, allowing you to understand the EUV-emitting plasma through radiation-hydrodynamics simulations
- Large amount of (image) data and a wide range of existing data analysis tools, allowing you to apply and develop your data analysis skills
- Cooperation within a large team of PhD- students and postdocs and close collaboration with a large industrial partner
More information?
For further information about the position, please contact:
Dr. Oscar Versolato
Group leader EUV Plasma Processes
E-mail: versolato@arcnl.nl
Phone: +31 (0)20-851 7100
Application
You can respond to this vacancy online via the button below.
Please send your:
- Resume
- Motivation letter on why you want to join the group (max. 1 page)
Online screening may be part of the selection.
Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.
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